Nanopatterning of Fluorinated Graphene by Electron Beam Irradiation. Withers, F., Bointon, T. H., Dubois, M., Russo, S., & Craciun, M. F. Nano Letters. Paper doi abstract bibtex We demonstrate the possibility to selectively reduce insulating fluorinated graphene to conducting and semiconducting graphene by electron beam irradiation. Electron-irradiated fluorinated graphene microstructures show 7 orders of magnitude decrease in resistivity (from 1 TΩ to 100 kΩ), whereas nanostructures show a transport gap in the source–drain bias voltage. In this transport gap, electrons are localized, and charge transport is dominated by variable range hopping. Our findings demonstrate a step forward to all-graphene transparent and flexible electronics.
@article{withers_nanopatterning_nodate,
title = {Nanopatterning of {Fluorinated} {Graphene} by {Electron} {Beam} {Irradiation}},
volume = {0},
url = {http://dx.doi.org/10.1021/nl2020697},
doi = {10.1021/nl2020697},
abstract = {We demonstrate the possibility to selectively reduce insulating fluorinated graphene to conducting and semiconducting graphene by electron beam irradiation. Electron-irradiated fluorinated graphene microstructures show 7 orders of magnitude decrease in resistivity (from 1 TΩ to 100 kΩ), whereas nanostructures show a transport gap in the source–drain bias voltage. In this transport gap, electrons are localized, and charge transport is dominated by variable range hopping. Our findings demonstrate a step forward to all-graphene transparent and flexible electronics.},
number = {0},
urldate = {2011-08-29},
journal = {Nano Letters},
author = {Withers, Freddie and Bointon, Thomas H. and Dubois, Marc and Russo, Saverio and Craciun, Monica F.},
}
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