Hyperuniformity in amorphous silicon based on the measurement of the infinite-wavelength limit of the structure factor. Xie, R., Long, G. G., Weigand, S. J., Moss, S. C., Carvalho, T., Roorda, S., Hejna, M., Torquato, S., & Steinhardt, P. J. Proceedings of the National Academy of Sciences, 110:13250, 2013. bibtex[publisher=National Academy of Sciences;pmid=23898166]
Hyperuniformity in amorphous silicon based on the measurement of the infinite-wavelength limit of the structure factor [link]Paper  doi  bibtex   
@article{citeulike:13099574,
	title = {Hyperuniformity in amorphous silicon based on the measurement of the infinite-wavelength limit of the structure factor},
	volume = {110},
	url = {http://dx.doi.org/10.1073/pnas.1220106110},
	doi = {10.1073/pnas.1220106110},
	journal = {Proceedings of the National Academy of Sciences},
	author = {Xie, Ruobing and Long, Gabrielle G. and Weigand, Steven J. and Moss, Simon C. and Carvalho, Tobi and Roorda, Sjoerd and Hejna, Miroslav and Torquato, Salvatore and Steinhardt, Paul J.},
	year = {2013},
	note = {bibtex[publisher=National Academy of Sciences;pmid=23898166]},
	keywords = {network},
	pages = {13250}
}

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