Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature. Xu, Q., Wu, M., Schneider, G. F., Houben, L., Malladi, S. K., Dekker, C., Yucelen, E., Dunin-Borkowski, R. E., & Zandbergen, H. W. ACS Nano, 7(2):1566–1572, February, 2013.
Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature [link]Paper  doi  abstract   bibtex   
We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.
@article{xu_controllable_2013,
	title = {Controllable {Atomic} {Scale} {Patterning} of {Freestanding} {Monolayer} {Graphene} at {Elevated} {Temperature}},
	volume = {7},
	issn = {1936-0851},
	url = {http://dx.doi.org/10.1021/nn3053582},
	doi = {10.1021/nn3053582},
	abstract = {We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.},
	number = {2},
	urldate = {2013-11-13},
	journal = {ACS Nano},
	author = {Xu, Qiang and Wu, Meng-Yue and Schneider, Grégory F. and Houben, Lothar and Malladi, Sairam K. and Dekker, Cees and Yucelen, Emrah and Dunin-Borkowski, Rafal E. and Zandbergen, Henny W.},
	month = feb,
	year = {2013},
	keywords = {Exfoliation, Graphene, clean},
	pages = {1566--1572},
}

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