Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature. Xu, Q., Wu, M., Schneider, G. F., Houben, L., Malladi, S. K., Dekker, C., Yucelen, E., Dunin-Borkowski, R. E., & Zandbergen, H. W. ACS Nano, 7(2):1566–1572, February, 2013. ![Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi abstract bibtex We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.
@article{xu_controllable_2013,
title = {Controllable {Atomic} {Scale} {Patterning} of {Freestanding} {Monolayer} {Graphene} at {Elevated} {Temperature}},
volume = {7},
issn = {1936-0851},
url = {http://dx.doi.org/10.1021/nn3053582},
doi = {10.1021/nn3053582},
abstract = {We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.},
number = {2},
urldate = {2013-11-13},
journal = {ACS Nano},
author = {Xu, Qiang and Wu, Meng-Yue and Schneider, Grégory F. and Houben, Lothar and Malladi, Sairam K. and Dekker, Cees and Yucelen, Emrah and Dunin-Borkowski, Rafal E. and Zandbergen, Henny W.},
month = feb,
year = {2013},
keywords = {Exfoliation, Graphene, clean},
pages = {1566--1572},
}
Downloads: 0
{"_id":"yA46Sz9tvzBAYm9aa","bibbaseid":"xu-wu-schneider-houben-malladi-dekker-yucelen-duninborkowski-etal-controllableatomicscalepatterningoffreestandingmonolayergrapheneatelevatedtemperature-2013","author_short":["Xu, Q.","Wu, M.","Schneider, G. F.","Houben, L.","Malladi, S. K.","Dekker, C.","Yucelen, E.","Dunin-Borkowski, R. E.","Zandbergen, H. W."],"bibdata":{"bibtype":"article","type":"article","title":"Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature","volume":"7","issn":"1936-0851","url":"http://dx.doi.org/10.1021/nn3053582","doi":"10.1021/nn3053582","abstract":"We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.","number":"2","urldate":"2013-11-13","journal":"ACS Nano","author":[{"propositions":[],"lastnames":["Xu"],"firstnames":["Qiang"],"suffixes":[]},{"propositions":[],"lastnames":["Wu"],"firstnames":["Meng-Yue"],"suffixes":[]},{"propositions":[],"lastnames":["Schneider"],"firstnames":["Grégory","F."],"suffixes":[]},{"propositions":[],"lastnames":["Houben"],"firstnames":["Lothar"],"suffixes":[]},{"propositions":[],"lastnames":["Malladi"],"firstnames":["Sairam","K."],"suffixes":[]},{"propositions":[],"lastnames":["Dekker"],"firstnames":["Cees"],"suffixes":[]},{"propositions":[],"lastnames":["Yucelen"],"firstnames":["Emrah"],"suffixes":[]},{"propositions":[],"lastnames":["Dunin-Borkowski"],"firstnames":["Rafal","E."],"suffixes":[]},{"propositions":[],"lastnames":["Zandbergen"],"firstnames":["Henny","W."],"suffixes":[]}],"month":"February","year":"2013","keywords":"Exfoliation, Graphene, clean","pages":"1566–1572","bibtex":"@article{xu_controllable_2013,\n\ttitle = {Controllable {Atomic} {Scale} {Patterning} of {Freestanding} {Monolayer} {Graphene} at {Elevated} {Temperature}},\n\tvolume = {7},\n\tissn = {1936-0851},\n\turl = {http://dx.doi.org/10.1021/nn3053582},\n\tdoi = {10.1021/nn3053582},\n\tabstract = {We show that by operating a scanning transmission electron microscope (STEM) with a 0.1 nm 300 kV electron beam, one can sculpt free-standing monolayer graphene with close-to-atomic precision at 600 °C. The same electron beam that is used for destructive sculpting can be used to image the sculpted monolayer graphene nondestructively. For imaging, a scanning dwell time is used that is about 1000 times shorter than for the sculpting. This approach allows for instantaneous switching between sculpting and imaging and thus fine-tuning the shape of the sculpted lattice. Furthermore, the sculpting process can be automated using a script. In this way, free-standing monolayer graphene can be controllably sculpted into patterns that are predefined in position, size, and orientation while maintaining defect-free crystallinity of the adjacent lattice. The sculpting and imaging processes can be fully computer-controlled to fabricate complex assemblies of ribbons or other shapes.},\n\tnumber = {2},\n\turldate = {2013-11-13},\n\tjournal = {ACS Nano},\n\tauthor = {Xu, Qiang and Wu, Meng-Yue and Schneider, Grégory F. and Houben, Lothar and Malladi, Sairam K. and Dekker, Cees and Yucelen, Emrah and Dunin-Borkowski, Rafal E. and Zandbergen, Henny W.},\n\tmonth = feb,\n\tyear = {2013},\n\tkeywords = {Exfoliation, Graphene, clean},\n\tpages = {1566--1572},\n}\n\n","author_short":["Xu, Q.","Wu, M.","Schneider, G. F.","Houben, L.","Malladi, S. K.","Dekker, C.","Yucelen, E.","Dunin-Borkowski, R. E.","Zandbergen, H. W."],"key":"xu_controllable_2013","id":"xu_controllable_2013","bibbaseid":"xu-wu-schneider-houben-malladi-dekker-yucelen-duninborkowski-etal-controllableatomicscalepatterningoffreestandingmonolayergrapheneatelevatedtemperature-2013","role":"author","urls":{"Paper":"http://dx.doi.org/10.1021/nn3053582"},"keyword":["Exfoliation","Graphene","clean"],"metadata":{"authorlinks":{}},"html":""},"bibtype":"article","biburl":"https://bibbase.org/zotero/spintextures","dataSources":["rXHvWQJHcL8ctHS4s"],"keywords":["exfoliation","graphene","clean"],"search_terms":["controllable","atomic","scale","patterning","freestanding","monolayer","graphene","elevated","temperature","xu","wu","schneider","houben","malladi","dekker","yucelen","dunin-borkowski","zandbergen"],"title":"Controllable Atomic Scale Patterning of Freestanding Monolayer Graphene at Elevated Temperature","year":2013}