ROLE OF ATOMIC OXYGEN PRODUCED BY AN ELECTRON-CYCLOTRON RESONANCE PLASMA IN THE OXIDATION OF YBA2CU3O7-X THIN-FILMS STUDIED BY INSITU RESISTIVITY MEASUREMENT. YAMAMOTO, K, LAIRSON, B., EOM, C., HAMMOND, R., BRAVMAN, J., & GEBALLE, T. APPLIED PHYSICS LETTERS, 57(18):1936-1938, OCT 29, 1990.
doi  bibtex   
@article{ ISI:A1990EF48900035,
Author = {YAMAMOTO, K and LAIRSON, BM and EOM, CB and HAMMOND, RH and BRAVMAN, JC
   and GEBALLE, TH},
Title = {{ROLE OF ATOMIC OXYGEN PRODUCED BY AN ELECTRON-CYCLOTRON RESONANCE PLASMA
   IN THE OXIDATION OF YBA2CU3O7-X THIN-FILMS STUDIED BY INSITU RESISTIVITY
   MEASUREMENT}},
Journal = {{APPLIED PHYSICS LETTERS}},
Year = {{1990}},
Volume = {{57}},
Number = {{18}},
Pages = {{1936-1938}},
Month = {{OCT 29}},
DOI = {{10.1063/1.104147}},
ISSN = {{0003-6951}},
ResearcherID-Numbers = {{Eom, Chang-Beom/I-5567-2014}},
Unique-ID = {{ISI:A1990EF48900035}},
}
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