LithoGAN: End-to-End Lithography Modeling with Generative Adversarial Networks. Ye, W., Alawieh, M. B., Lin, Y., & Pan, D. Z. In Proceedings of the 56th Annual Design Automation Conference 2019 on - DAC '19, pages 1–6, Las Vegas, NV, USA, 2019. ACM Press. ![LithoGAN: End-to-End Lithography Modeling with Generative Adversarial Networks [link]](https://bibbase.org/img/filetypes/link.svg "link")
Paper doi bibtex @inproceedings{ye_lithogan_2019,
address = {Las Vegas, NV, USA},
title = {{LithoGAN}: {End}-to-{End} {Lithography} {Modeling} with {Generative} {Adversarial} {Networks}},
isbn = {978-1-4503-6725-7},
shorttitle = {{LithoGAN}},
url = {http://dl.acm.org/citation.cfm?doid=3316781.3317852},
doi = {10.1145/3316781.3317852},
language = {en},
urldate = {2019-05-31},
booktitle = {Proceedings of the 56th {Annual} {Design} {Automation} {Conference} 2019 on - {DAC} '19},
publisher = {ACM Press},
author = {Ye, Wei and Alawieh, Mohamed Baker and Lin, Yibo and Pan, David Z.},
year = {2019},
keywords = {\#broken, Jab/\#ADAC},
pages = {1--6},
}
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