Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide. Zhao, Y., Wang, F., Cui, Z. C., Zheng, J., Zhang, H. M., Zhang, D., Liu, S. Y., & Yi, M. Microelectron. J., 35(7):605-608, 2004. Link Paper bibtex @article{journals/mj/ZhaoWCZZZLY04,
added-at = {2020-03-09T00:00:00.000+0100},
author = {Zhao, Y. and Wang, F. and Cui, Z. C. and Zheng, J. and Zhang, H. M. and Zhang, Daming and Liu, S. Y. and Yi, Maobin},
biburl = {https://www.bibsonomy.org/bibtex/27468761186ab08ef9d52a2ed8462195a/dblp},
ee = {https://doi.org/10.1016/j.mejo.2004.02.005},
interhash = {5a4823fc7cf02cc01f533645af5ef39a},
intrahash = {7468761186ab08ef9d52a2ed8462195a},
journal = {Microelectron. J.},
keywords = {dblp},
number = 7,
pages = {605-608},
timestamp = {2020-03-10T11:40:52.000+0100},
title = {Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide.},
url = {http://dblp.uni-trier.de/db/journals/mj/mj35.html#ZhaoWCZZZLY04},
volume = 35,
year = 2004
}
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