Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide. Zhao, Y., Wang, F., Cui, Z. C., Zheng, J., Zhang, H. M., Zhang, D., Liu, S. Y., & Yi, M. Microelectron. J., 35(7):605-608, 2004.  
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Paper  bibtex   @article{journals/mj/ZhaoWCZZZLY04,
  added-at = {2020-03-09T00:00:00.000+0100},
  author = {Zhao, Y. and Wang, F. and Cui, Z. C. and Zheng, J. and Zhang, H. M. and Zhang, Daming and Liu, S. Y. and Yi, Maobin},
  biburl = {https://www.bibsonomy.org/bibtex/27468761186ab08ef9d52a2ed8462195a/dblp},
  ee = {https://doi.org/10.1016/j.mejo.2004.02.005},
  interhash = {5a4823fc7cf02cc01f533645af5ef39a},
  intrahash = {7468761186ab08ef9d52a2ed8462195a},
  journal = {Microelectron. J.},
  keywords = {dblp},
  number = 7,
  pages = {605-608},
  timestamp = {2020-03-10T11:40:52.000+0100},
  title = {Study of reactive ion etching process to fabricate the PMMA-based polymer waveguide.},
  url = {http://dblp.uni-trier.de/db/journals/mj/mj35.html#ZhaoWCZZZLY04},
  volume = 35,
  year = 2004
} 
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