On the application of boron and phosphorus heavily doped LPCVD polycrystalline silicon thin films as thermoelectric materials. Zonja, S., Ocko, M., Ivanda, M., Suligoj, T., & Biljanovic, P. In 2012 Proceedings of the 35th International Convention, MIPRO 2012, Opatija, Croatia, May 21-25, 2012, pages 19--20, 2012. Paper bibtex @inproceedings{DBLP:conf/mipro/ZonjaOISB12,
author = {Sanja Zonja and
Miroslav Ocko and
Mile Ivanda and
Tomislav Suligoj and
Petar Biljanovic},
title = {On the application of boron and phosphorus heavily doped {LPCVD} polycrystalline
silicon thin films as thermoelectric materials},
booktitle = {2012 Proceedings of the 35th International Convention, {MIPRO} 2012,
Opatija, Croatia, May 21-25, 2012},
pages = {19--20},
year = {2012},
crossref = {DBLP:conf/mipro/2012},
url = {http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=6240604},
timestamp = {Fri, 31 May 2013 15:22:42 +0200},
biburl = {http://dblp.dagstuhl.de/rec/bib/conf/mipro/ZonjaOISB12},
bibsource = {dblp computer science bibliography, http://dblp.org}
}
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