On the application of boron and phosphorus heavily doped LPCVD polycrystalline silicon thin films as thermoelectric materials. Zonja, S., Ocko, M., Ivanda, M., Suligoj, T., & Biljanovic, P. In 2012 Proceedings of the 35th International Convention, MIPRO 2012, Opatija, Croatia, May 21-25, 2012, pages 19--20, 2012.
On the application of boron and phosphorus heavily doped LPCVD polycrystalline silicon thin films as thermoelectric materials [link]Paper  bibtex   
@inproceedings{DBLP:conf/mipro/ZonjaOISB12,
  author    = {Sanja Zonja and
               Miroslav Ocko and
               Mile Ivanda and
               Tomislav Suligoj and
               Petar Biljanovic},
  title     = {On the application of boron and phosphorus heavily doped {LPCVD} polycrystalline
               silicon thin films as thermoelectric materials},
  booktitle = {2012 Proceedings of the 35th International Convention, {MIPRO} 2012,
               Opatija, Croatia, May 21-25, 2012},
  pages     = {19--20},
  year      = {2012},
  crossref  = {DBLP:conf/mipro/2012},
  url       = {http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=6240604},
  timestamp = {Fri, 31 May 2013 15:22:42 +0200},
  biburl    = {http://dblp.dagstuhl.de/rec/bib/conf/mipro/ZonjaOISB12},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}

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